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    • China CVD TAC COATING Manufacturer, Supplier, Factory

    As a professional CVD TAC COATING manufacturer and supplier in China, we have our own factory. Whether you need customized services to meet the specific needs of your region or want to buy advanced and durable CVD TAC COATING made in China, you can leave us a message.

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    • Tantalum Carbide TaC Coated Halfmoon

      Tantalum Carbide TaC Coated Halfmoon

      VeTek Semiconductor is the leading manufacturer and supplier in China for Tantalum Carbide TaC Coated Halfmoon, we specialized in R&D and production,can control the quality well and offer a competitive price. You are welcome to visit our factory for further discussion on a long-term cooperation.
    • SiC Coating Epi susceptor

      SiC Coating Epi susceptor

      VeTek Semiconductor is a leading manufacturer, innovator and leader of SiC Coating Epi Susceptor products in China. For many years, we have been focusing on various SiC Coating products such as SiC Coating Epi Susceptor, SiC Coating Wafer Carrier, SiC Coating Susceptor, SiC coating ALD susceptor, etc. VeTek Semiconductor is committed to providing advanced technology and product solutions for the semiconductor industry. Welcome your further consultation.
    • Tantalum Carbide Coated Tube for Crystal Growth

      Tantalum Carbide Coated Tube for Crystal Growth

      VeTek Semiconductor is a leading Tantalum Carbide Coated Tube for Crystal Growth manufacturer and innovator in China.We have been specialized in ceramic coating for many years.Our products have a high purity and high temperature resistance.We look forward to becoming your long-term partner in China.
    • Vitreous Carbon Coated Graphite Crucible for E-beam Gun

      Vitreous Carbon Coated Graphite Crucible for E-beam Gun

      VeTek Semiconductor is a leading supplier of customized Vitreous Carbon Coated Graphite Crucible for E-beam Gun in China, specializing in advanced materials for many years. Our Vitreous Carbon Coated Graphite Crucible is specifically designed for E-beam Gun, ensuring excellent performance. Made from ultra-pure imported graphite, it offers reliability and durability. Visit our factory in China to explore deep cooperation.
    • Aixtron Satellite wafer carrier

      Aixtron Satellite wafer carrier

      As a professional Aixtron Satellite Wafer Carrier product manufacturer and innovator in China, VeTek Semiconductor’s Aixtron Satellite Wafer Carrier is a wafer carrier used in AIXTRON equipment, mainly used in MOCVD processes in semiconductor processing, and is particularly suitable for high-temperature and high-precision semiconductor processing processes. The carrier can provide stable wafer support and uniform film deposition during MOCVD epitaxial growth, which is essential for the layer deposition process. Welcome your further consultation.
    • Silicon Carbide Seal Ring

      Silicon Carbide Seal Ring

      As a professional Silicon Carbide Seal Ring product manufacturer and factory in China, VeTek Semiconductor Silicon Carbide Seal Ring is widely used in semiconductor processing equipment due to its excellent heat resistance, corrosion resistance, mechanical strength and thermal conductivity. It is especially suitable for processes involving high temperature and reactive gases such as CVD, PVD and plasma etching, and is a key material choice in the semiconductor manufacturing process. Your further inquiries are welcome.
    • Related Blog
    • Reviews

    • How much do you know about sapphire?

      This article describes that LED substrate is the largest application of sapphire, as well as the main methods of preparing sapphire crystals: growing sapphire crystals by the Czochralski method, growing sapphire crystals by the Kyropoulos method, growing sapphire crystals by the guided mold method, and growing sapphire crystals by the heat exchange method.

    • Uses of solid silicon carbide

      Solid silicon carbide has excellent properties such as high temperature stability, high hardness, good abrasion resistance, and good chemical stability, so it has a wide range of applications. The following are some applications of solid silicon carbide:

    • GaN-based low-temperature epitaxy technology

      This article mainly describes GaN-based low-temperature epitaxial technology, including the crystal structure of GaN-based materials, 3. epitaxial technology requirements and implementation solutions, the advantages of low-temperature epitaxial technology based on PVD principles, and the development prospects of low-temperature epitaxial technology.

    • Chip Manufacturing: Atomic Layer Deposition (ALD)

      In the semiconductor manufacturing industry, as device size continues to shrink, the deposition technology of thin film materials has posed unprecedented challenges. Atomic Layer Deposition (ALD), as a thin film deposition technology that can achieve precise control at the atomic level, has become an indispensable part of semiconductor manufacturing. This article aims to introduce the process flow and principles of ALD to help understand its important role in advanced chip manufacturing.

    • What is the difference between epitaxy and ALD?

      The main difference between epitaxy and atomic layer deposition (ALD) lies in their film growth mechanisms and operating conditions. Epitaxy refers to the process of growing a crystalline thin film on a crystalline substrate with a specific orientation relationship, maintaining the same or similar crystal structure. In contrast, ALD is a deposition technique that involves exposing a substrate to different chemical precursors in sequence to form a thin film one atomic layer at a time.

    • Based on 8-inch silicon carbide single crystal growth furnace technology

      Silicon carbide is one of the ideal materials for making high-temperature, high-frequency, high-power and high-voltage devices. In order to improve production efficiency and reduce costs, the preparation of large-size silicon carbide substrates is an important development direction.

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