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  • TaC Coating Plate

    • China TaC Coating Plate Manufacturer, Supplier, Factory

    As a professional TaC Coating Plate manufacturer and supplier in China, we have our own factory. Whether you need customized services to meet the specific needs of your region or want to buy advanced and durable TaC Coating Plate made in China, you can leave us a message.

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    • CVD TaC Coating Crucible

      CVD TaC Coating Crucible

      VeTek Semiconductor is a professional manufacturer and leader of CVD TaC Coating Crucible products in China. CVD TaC Coating Crucible is based on tantalum carbon (TaC) coating. The tantalum carbon coating is evenly covered on the surface of the crucible through chemical vapor deposition (CVD) process to enhance its heat resistance and corrosion resistance. It is a material tool specially used in high temperature extreme environments. Welcome your further consultation.
    • Silicon Carbide Ceramic Coating

      Silicon Carbide Ceramic Coating

      As a professional Silicon Carbide Ceramic Coating manufacturer and supplier in China, Vetek Semiconductor's Silicon Carbide Ceramic Coating is widely used on key components of semiconductor manufacturing equipment, especially when CVD and PECVD processes are involved. Welcome your inquiry.
    • Solid SiC Gas Shower Head

      Solid SiC Gas Shower Head

      VeTek Semiconductor is a leading Solid SiC Gas Shower Head manufacturer and innovator in China.We have been specialized in semiconductor material for many years.VeTek Semiconductor Solid SiC Gas Shower Head’s multi-porosity design ensures that the heat generated in the CVD process can be dispersed, ensuring that the substrate is heated evenly.We look forward to setting up long-term with you in China.
    • MOCVD Susceptor with TaC Coating

      MOCVD Susceptor with TaC Coating

      VeTek Semiconductor is a comprehensive supplier involved in the research, development, production, design, and sales of TaC coatings and SiC coating parts. Our expertise lies in the production of state-of-the-art MOCVD Susceptor with TaC Coating, which play a vital role in the LED epitaxy process. We welcome you to discuss with us inquiries and further information.
    • Semiconductor Quartz Bell Jar

      Semiconductor Quartz Bell Jar

      Vetek Semiconductor is a professional Semiconductor Quartz Bell Jar manufacturer and supplier in China. Our Semiconductor Quartz Bell Jar is widely used in key components of semiconductor manufacturing equipment, especially in CVD, diffusion, oxidation and PVD processes. Vetek Semiconductor is committed to providing advanced Semiconductor Quartz Bell Jar products and technical solutions for the semiconductor industry. Welcome your further inquiries.
    • CVD SiC Coating Baffle

      CVD SiC Coating Baffle

      Vetek Semiconductor's CVD SiC Coating Baffle is mainly used in Si Epitaxy. It is usually used with silicon extension barrels. It combines the unique high temperature and stability of the CVD SiC Coating Baffle, which greatly improves the uniform distribution of airflow in semiconductor manufacturing. We believe that our products can bring you Advanced Technology and High-Quality Product Solutions.
    • Related Blog
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    • What is Tantalum Carbide Coating?

      This article introduces the product characteristics of TaC coating, the specific process of preparing TaC coating products using CVD process, and introduces VeTek Semiconductor's most popular TaC coating.

    • GaN-based low-temperature epitaxy technology

      This article mainly describes GaN-based low-temperature epitaxial technology, including the crystal structure of GaN-based materials, 3. epitaxial technology requirements and implementation solutions, the advantages of low-temperature epitaxial technology based on PVD principles, and the development prospects of low-temperature epitaxial technology.

    • What is Porous Graphite? - VeTek Semiconductor

      This article describes the physical parameters and product characteristics of VeTek Semiconductor's Porous Graphite, as well as its specific applications in semiconductor processing.

    • Chinese companies are reportedly developing 5nm chips with Broadcom!

      According to overseas news, two sources revealed on June 24 that ByteDance is working with US chip design company Broadcom to develop an advanced artificial intelligence (AI) computing processor, which will help ByteDance ensure an adequate supply of high-end chips amid tensions between China and the United States.

    • 8-inch SiC epitaxial furnace and homoepitaxial process research

      8-inch SiC epitaxial furnace and homoepitaxial process research

    • What is the difference between epitaxy and ALD?

      The main difference between epitaxy and atomic layer deposition (ALD) lies in their film growth mechanisms and operating conditions. Epitaxy refers to the process of growing a crystalline thin film on a crystalline substrate with a specific orientation relationship, maintaining the same or similar crystal structure. In contrast, ALD is a deposition technique that involves exposing a substrate to different chemical precursors in sequence to form a thin film one atomic layer at a time.

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