VeTek Semiconductor is a leading Tantalum Carbide Coated Planetary Rotation Disk manufacturer and innovator in China.We have been specialized in ceramic coating for many years.Our products have a high purity and high temperature resistance.We look forward to becoming your long-term partner in China.
High quality Tantalum Carbide Coated Planetary Rotation Disk is offered by China manufacturer VeTek Semiconductor. Buy Tantalum Carbide Coated Planetary Rotation Disk which is of high quality directly with low price.
The tantalum carbide coated planetary rotation disk is an accessory designed for the AIXTRON G10 MOCVD system, aiming to enhance efficiency and quality in semiconductor manufacturing. Crafted from high-quality materials and manufactured with precision, the tantalum carbide coated planetary rotation disk offers outstanding performance and reliability for Metal-Organic Chemical Vapor Deposition (MOCVD) processes.
The Planetary Disk is constructed using a graphite substrate coated with CVD TaC, providing excellent thermal stability, high purity, and resistance to high temperatures.
Customizable to accommodate different semiconductor wafer sizes, the Planetary Disk is suitable for various production requirements. Its robust construction is specifically designed to withstand the demanding operating conditions of the MOCVD system, ensuring long-lasting performance and minimizing downtime and maintenance costs associated with wafer carriers and susceptors.
With the Planetary Disk, the AIXTRON G10 MOCVD system can achieve higher efficiency and superior results in semiconductor manufacturing. Its exceptional thermal stability, compatibility with different wafer sizes, and reliable performance make it an essential tool for optimizing production efficiency and achieving outstanding outcomes in the challenging MOCVD environment.
Physical properties of TaC coating | |
Density | 14.3 (g/cm³) |
Specific emissivity | 0.3 |
Thermal expansion coefficient | 6.3*10-6/K |
Hardness (HK) | 2000 HK |
Resistance | 1×10-5 Ohm*cm |
Thermal stability | <2500℃ |
Graphite size changes | -10~-20um |
Coating thickness | ≥20um typical value (35um±10um) |